Ripple formation and smoothening on insulating surfaces

被引:14
作者
Headrick, Randall L. [1 ,2 ]
Zhou, Hua [3 ]
机构
[1] Univ Vermont, Dept Phys, Burlington, VT 05405 USA
[2] Univ Vermont, Mat Sci Program, Burlington, VT 05405 USA
[3] Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
基金
美国国家科学基金会; 美国国家卫生研究院;
关键词
X-RAY-SCATTERING; ION-SPUTTERED SURFACES; THIN-FILM GROWTH; GRAZING-INCIDENCE; BEAM EROSION; DIFFRACTION; ENERGY; BOMBARDMENT; MORPHOLOGY; SI;
D O I
10.1088/0953-8984/21/22/224005
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Ion bombardment of insulating surfaces such as Al(2)O(3) and SiO(2) produces ordered patterns of ripples. The ripple wavelength varies with ion energy, incidence angle and substrate temperature. A region of stability is also known to exist for near-normal incidence during Ar(+) ion bombardment, where initially rough surfaces are smoothened. A number of relaxation mechanisms are found to be operative under specific conditions, including: surface-confined viscous flow, impact-induced lateral currents and impact-assisted surface diffusion during ion bombardment at high temperatures. Most of the experimentally observed phenomena are explained through extension of the Bradley-Harper theory by the addition of these new processes. Phenomena that are not explained by the linear theory, such as the saturation of surface amplitude during the formation of ripples, are thought to arise from nonlinear effects. This contribution describes the present status of the linear theory relevant to this class of materials and recent experimental results.
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页数:12
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