Epitaxial growth of metals by sputter deposition

被引：35

作者：

Harp, GR ^{[1
]}

Parkin, SSP ^{[1
]}

机构：

[1] IBM CORP,ALMADEN RES CTR,DIV RES,SAN JOSE,CA 95120

来源：

THIN SOLID FILMS | 1996年 / 288卷 / 1-2期

关键词：

epitaxy; multilayers; sputtering; X-ray diffraction;

D O I：

10.1016/S0040-6090(96)08808-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Results are presented detailing the crystallographic quality of a number of metal films deposited by epitaxial sputter deposition. Such films have single-orientation f.c.c., h.c.p., b.c.c. and hybrid crystal structures, and include the elements Ag, Au, Co, Cr, Cu, Fe, Rh, Ru, Pd and V. The crystal structure was characterized using X-ray diffraction analysis.

引用

收藏

页码：315 / 324

页数：10

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