Time dependent diffusion coefficient of water into silica glass at low temperatures

被引:30
作者
Tomozawa, M [1 ]
Davis, KM [1 ]
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1999年 / 272卷 / 01期
基金
美国国家科学基金会;
关键词
water diffusion; water solubility; silica glass; stress; structural relaxation;
D O I
10.1016/S0921-5093(99)00463-3
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The diffusion of water into silica glass at low temperatures (<1000 degrees C) exhibits a peculiar time dependence: the diffusion coefficient decreases at first and then increases with time at a constant temperature under a constant water vapor pressure. Water solubility exhibits the opposite trend: it initially increases with time and subsequently decreases with time. The initial decrease in diffusion coefficient and increase in solubility with time is attributed to the decrease of the self-stress around the diffusing water molecules by stress relaxation of the surrounding glass. The subsequent increase in diffusion coefficient and decrease in solubility with time is attributed to the structural relaxation of the glass and the corresponding change of the glass-water reaction equilibrium constant. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:114 / 119
页数:6
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