Magnetization canting in epitaxial Cu/Ni/Cu/Si(001) films

The magnetic anisotropy of epitaxial Cu(50 Angstrom)/Ni(t(Ni)/Cu(2000 Angstrom)/Si(001) films as a function of the nickel film thickness (30 Angstrom less than or equal to t(Ni)less than or equal to 150 Angstrom) has been studied using a torque magnetometer. It is found that the magnetization rotates continuously from out-of-plane to in-plane as the nickel film thickness increases. For the 150 Angstrom film, the magnetization cants at 42 degrees with respect to the film normal. The canting state is possible because K-4(eff) is positive. The magnitude of K-4(eff) (approximate to 10(5) ergs/cm(3)) is an order of magnitude greater than the corresponding magnetocrystalline anisotropy constant of nickel. The origin of the fourth-order anisotropy in these films is believed to be magnetoelastic in nature. (C) 2000 American Institute of Physics. [S0021-8979(00)68108-2].