Permalloy patterning effects on RF inductors

被引：18

作者：

Ni, Weiping ^{[1
]}

Kim, Jinsook ^{[1
]}

Kan, Edwin C. ^{[1
]}

机构：

[1] Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2006年 / 42卷 / 10期

关键词：

eddy current; ferromagnetic resonance; RF inductor; substrate loss;

D O I：

10.1109/TMAG.2006.879140

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Permalloy incorporated RF spiral inductors are fabricated on standard silicon substrates with a CMOS compatible process. Various patterns of permalloy thin films are designed to investigate the influences on the inductor performance with respect to different magnetization orientations, ferromagnetic resonance (FMR), induced eddy current, parasitic capacitance, and substrate loss.

引用

页码：2827 / 2829

页数：3

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