Effect of niobium dopant on fatigue characteristics of BiFeO3 thin films grown on Pt electrodes

被引：61

作者：

Simoes, A. Z. ^{[1
]}

Pianno, R. F. ^{[1
]}

Aguiar, E. C. ^{[1
]}

Longo, E. ^{[1
]}

Varela, J. A. ^{[1
]}

机构：

[1] UNESP, Inst Chem, Dept Chem Phys, BR-14800900 Araraquara, SP, Brazil

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2009年 / 479卷 / 1-2期

基金：

巴西圣保罗研究基金会;

关键词：

Ferroelectrics; Thin films; Chemical synthesis; X-ray diffraction; Transmission electron microscopy; FERROELECTRIC POLARIZATION; FERROMAGNETISM; CRYSTAL;

D O I：

10.1016/j.jallcom.2009.01.074

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Pure BiFeO3 (BFO) and Nb-doped (BFN) thin films were fabricated by the soft chemical method. The films were polycrystalline when deposited on Pt/Ti/SiO2/Si substrate and annealed at 500 degrees C for 2 h. X-ray diffraction analysis revealed that the film was fully crystallized. The grain size decreased in the BFN films due the suppression of oxygen vacancy concentration in the BFO lattice. The Nb dopant is effective in improving electrical properties of BFO films. With increase niobium content we obtained thin films free of fatigue up to 10(8) cycles. (C) 2009 Published by Elsevier B.V.

引用

页码：274 / 279

页数：6