Structure and mechanical properties of pure titanium film deposited onto TiNi shape memory alloy substrate by magnetron DC sputtering

被引:20
|
作者
Sonoda, T [1 ]
Watazu, A [1 ]
Zhu, J [1 ]
Shi, W [1 ]
Kato, K [1 ]
Asahina, T [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Moriyama Ku, Nagoya, Aichi 4638560, Japan
关键词
shape memory alloy; TiNi; titanium; coating; sputtering; biocompatibility;
D O I
10.1016/j.tsf.2003.12.147
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In order to improve the biocompatibility of TiNi shape memory alloy, coating of the alloy substrates with pure titanium films by magnetron DC sputtering in Ar gas was examined and the effects of the substrate temperature (ranging from 20 to approx. 400 degreesC) on the formation of the titanium film were investigated. The titanium films deposited under various substrate temperatures appeared to be uniform and adhesive. Under SEM, the surface morphology of the obtained titanium films gradually changed from the structure consisting of fine particles to that of fine fibers with increase in substrate temperature. Based on XRD, it was concluded that each of the films consisted of alpha-titanium phase. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:212 / 215
页数:4
相关论文
共 50 条
  • [1] A surface cleaning method for sputter deposition of pure titanium film onto TiNi shape memory alloy substrate
    Sonoda, T
    Watazu, A
    Zhu, J
    Kamiya, A
    Ushiki, K
    Naganuma, K
    Kato, M
    VACUUM, 2001, 60 (1-2) : 197 - 199
  • [2] A low temperature in-situ crystalline TiNi shape memory thin film deposited by magnetron sputtering
    Cicek, Hikmet
    Efeoglu, Ihsan
    Totik, Yasar
    Ezirmik, Kadri Vefa
    Arslan, Ersin
    SURFACE & COATINGS TECHNOLOGY, 2015, 284 : 90 - 93
  • [3] Nanoscale compositional analysis of NiTi shape memory alloy films deposited by DC magnetron sputtering
    Sharma, S. K.
    Mohan, S.
    Bysakh, S.
    Kumar, A.
    Kamat, S. V.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2013, 31 (06):
  • [4] Properties of titanium thin films deposited by dc magnetron sputtering
    Jeyachandran, Y. L.
    Karunagaran, B.
    Narayandass, Sa. K.
    Mangalaraj, D.
    Jenkins, T. E.
    Martin, P. J.
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2006, 431 (1-2): : 277 - 284
  • [5] Development of TiNi shape memory alloy film deposited by sputtering from separate Ti and Ni targets
    Ohta, A
    Bhansali, S
    Kishimoto, I
    Umeda, A
    MATERIALS AND DEVICE CHARACTERIZATION IN MICROMACHINING, 1998, 3512 : 138 - 145
  • [6] Fatigue and adhesion properties of martensite and austenite phases of TiNi shape memory thin films deposited by magnetron sputtering
    Cicek, Hikmet
    Efeoglu, Ihsan
    SURFACE & COATINGS TECHNOLOGY, 2016, 308 : 174 - 181
  • [7] Thermomechanical behavior of Ti-Ni shape memory alloy films deposited by DC magnetron sputtering
    Namazu, Takahiro
    Inoue, Shozo
    Hashizume, Akinobu
    Koterazawa, Keiji
    VACUUM, 2006, 80 (07) : 726 - 731
  • [8] MECHANICAL AND TRIBOLOGICAL CHARACTERIZATION OF TUNGSTEN-TITANIUM THIN FILM COATINGS DEPOSITED BY DC MAGNETRON SPUTTERING
    Innal, Fahima
    Lekoui, Fouaz
    Ouchabane, Mouhamed
    Legouera, Messaoud
    Mechachti, Salim
    Henni, Laid
    ACTA TECHNICA NAPOCENSIS SERIES-APPLIED MATHEMATICS MECHANICS AND ENGINEERING, 2020, 63 (02): : 197 - 204
  • [9] Effects of Pulse Bias on Structure and Properties of MoN Film Deposited by DC Magnetron Sputtering
    Xu Xing
    Su Fenghua
    Li Zhujun
    CHINA SURFACE ENGINEERING, 2019, 32 (02) : 54 - 62
  • [10] Structural, morphological and mechanical hardness properties of titanium nitride thin films deposited by DC magnetron sputtering: Effect of substrate temperature
    Hosseinnejad, M. T.
    Ettehadi-Abari, M.
    Panahi, N.
    Zadeh, M. A. Ferdosi
    Case, S. W.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2017, 19 (5-6): : 434 - 439