Coherent diffraction imaging of a single epitaxial InAs nanowire using a focused x-ray beam

被引:53
作者
Diaz, A. [1 ,2 ]
Mocuta, C. [1 ]
Stangl, J. [2 ]
Mandl, B. [2 ]
David, C. [3 ]
Vila-Comamala, J. [3 ]
Chamard, V. [4 ,5 ]
Metzger, T. H. [1 ]
Bauer, G. [2 ]
机构
[1] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[2] Johannes Kepler Univ Linz, Inst Semicond & Solid State Phys, A-4040 Linz, Austria
[3] Paul Scherrer Inst, CH-5232 Villigen, Switzerland
[4] Aix Marseille Univ, IM2NP, FST Ave Escadrille Normandie Niemen, F-13397 Marseille, France
[5] CNRS, IM2NP, FST Ave Escadrille Normandie Niemen, F-13397 Marseille, France
来源
PHYSICAL REVIEW B | 2009年 / 79卷 / 12期
关键词
III-V semiconductors; indium compounds; nanowires; semiconductor epitaxial layers; X-ray diffraction; X-ray imaging; PHASE RETRIEVAL; CRYSTAL; GROWTH;
D O I
10.1103/PhysRevB.79.125324
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The cross section of an InAs nanowire with a diameter of 150 nm epitaxially grown on a 111-oriented InP substrate was characterized using a combination of x-ray scanning microdiffraction and coherent diffraction imaging. Using an x-ray beam focused by a Fresnel zone plate, we were able to scan in real space and hence localize single nanowires on the substrate in the as-grown epitaxial state. For one single nanowire, the three-dimensional coherent intensity distribution in reciprocal space was mapped around the (111) InAs reflection. Using phase retrieval algorithms, the cross section of the wire was reconstructed with a spatial resolution of 8 nm along one direction.
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页数:5
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