Methods for mitigating surface damage growth on NIF final optics

被引:48
作者
Hrubesh, LW [1 ]
Norton, MA [1 ]
Molander, WA [1 ]
Donohue, EE [1 ]
Maricle, SM [1 ]
Penetrante, BM [1 ]
Brusasco, RM [1 ]
Grundler, W [1 ]
Butler, JA [1 ]
Carr, JW [1 ]
Hill, RM [1 ]
Summers, LJ [1 ]
Feit, MD [1 ]
Rubenchik, A [1 ]
Key, MH [1 ]
Wegner, PJ [1 ]
Burnham, AK [1 ]
Hackel, LA [1 ]
Kozlowski, MR [1 ]
机构
[1] Lawrence Livermore Natl Lab, Livermore, CA 94550 USA
来源
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2001 PROCEEDINGS | 2002年 / 4679卷
关键词
laser damage; chemical etching; damage growth mitigation; plasma etching; C-02 laser processing;
D O I
10.1117/12.461723
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report a summary of the surface damage, growth mitigation effort at 3omega for fused silica optics at LLNL. The objective was to experimentally validate selected methods that could be applied to pre-initiated or retrieved-from-service optics, to stop further damage growth. A specific goal was to obtain sufficient data and information on successful methods for fused silica optics to select a single approach for processing NIF optics. This paper includes the test results and the evaluation thereof, for several mitigation methods for fused silica. The mitigation methods tested in this study are wet chemical etching, cold plasma etching, CO2 laser processing, and micro-flame torch processing. We found that CO2 laser processing produces the most significant and consistent results to halt laser-induced surface damage growth on fused silica. We recorded successful mitigation of the growth of laser-induced surface damage sites as large as 0.5mm. diameter, for 1000 shots at fluences in the range of 8 to 13 J/cm(2). We obtained sufficient data for elimination of damage growth using CO2 laser processing on subaperture representative optics, to proceed with application to full-scale NIF optics.
引用
收藏
页码:23 / 33
页数:11
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