Progress in the synthesis of poly (4-hydroxystyrene) for polymer photoresists

With the development of the integrate circuit chip technology, more and more attentions have been paid to the synthesis of polymer photoresists with homogeneous chemical and physical features, for the reason that the fabricating polymer photoresists based on poly (4-hydroxystyrene) became one of the key technologies for making the 0.11 mum chip. In this paper, the methods of synthesizing narrow dispersing polymer photoresists based on poly (4-hydroxystyrene) was reviewed and compared with each other, in order to provide a useful guide for the synthesizing polymer photoresists based on poly (4-hydroxystyrene)