Formation of mesostructured silica in nonionic fluorinated surfactant systems

被引:36
作者
Esquena, J.
Rodriguez, C.
Solans, C.
Kunieda, H.
机构
[1] CSIC, IIQAB, Technol Surfactants, ES-08034 Barcelona, Spain
[2] Yokohama Natl Univ, Grad Sch Environm & Informat Sci, Hodogaya Ku, Yokohama, Kanagawa 2408501, Japan
[3] Univ Santiago de Compostela, Dept Quim Fis, Fac Quim, E-15782 Santiago De Compostela, Spain
基金
日本学术振兴会;
关键词
fluorinated surfactant; self-aggregation; mesostructured material; mesoporous; silica;
D O I
10.1016/j.micromeso.2006.01.003
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
The aqueous phase behavior and preparation of mesoporous silica by new fluorinated surfactants C8F17SO2(C3H7)N(C2H4O)(n)H (abbreviated C8F17(EO)(n)) is reported here. C8F17(EO)(n) forms elongated micelles and liquid crystals in water. Mesostructured silica was prepared by the cooperative self-assembly precipitation method and a systematic study was carried out, investigating the influence of surfactant and silica precursor (TEOS) concentrations, pH and the effect of poly(ethylene oxide) chain lengths. The resulting materials were characterized by SAXS, nitrogen sorption and TEM. The pore inner diameters are small (<= 35 angstrom) and the pore walls are thick (> 20 angstrom). The materials possess high specific surface areas (approximate to 1000 m(2)/g), in which are achieved at very small surfactant concentrations (2 wt.%), producing robust thick walls with no significant microporosity. The specific surface area is preserved during calcination despite a small shrinkage attributed to silica cross-linking. The d-spacing appeared invariable over a wide range of surfactant/SiO2 ratios, between 0.006 and 1 molar ratios. Hexagonal ordered (p6mm) mesopores were formed at HCl concentrations higher than 0.1 M, while disordered worm-like mesopores were obtained at HCl concentrations lower than 0.1 M. The optimum ethylene oxide chain length to obtain well-ordered mesoporous hexagonal silica corresponded to 10 ethylene oxide units. (c) 2006 Elsevier Inc. All rights reserved.
引用
收藏
页码:212 / 219
页数:8
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