Three-dimensional step-height measurement using sinusoidal wavelength scanning interferometer with four-step phase-shift method

被引:10
作者
Choi, Samuel [1 ]
Takahashi, Shouhei [2 ]
Sasaki, Osami [1 ]
Suzuki, Takamasa [2 ]
机构
[1] Niigata Univ, Dept Elect & Elect Engn, Niigata 9502102, Japan
[2] Niigata Univ, Grad Sch Sci & Technol, Niigata 9502102, Japan
关键词
interferometer; phase-shifting method; wavelength scanning interferometry; step-height surface measurement; SURFACE PROFILE MEASUREMENT; THIN-FILM; THICKNESS;
D O I
10.1117/1.OE.53.8.084110
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A sinusoidal wavelength scanning interferometer with the four-step phase-shift method is demonstrated for a three-dimensional profile measurement. The interference phase-shift signal generated by the sinusoidal wavelength scanning contains information about optical path difference covering a nm-mu m scale structure. The interference phase-shift signal was obtained by the four-step phase-shifting method. The sinusoidal wavelength shifting with a frequency of approximately 180 Hz and tunable range of 5.7 nm was performed by the Littman-Metcalf external resonator-type tunable laser with a center of 772.1 nm. The full-field surface profile measurement was conducted by a charge coupled device image sensor with an accuracy on a nm scale. The surface profiles of gauge blocks with a step height up to about 10 mu m were successfully measured with a surface profile irregularity of 3.8 x 10(-2) mu m. The deviations of two measured surfaces of upper and lower steps were estimated to be 1.6 x 10(-2) mu m and 3.1 x 10(-2) mu m, respectively. (C) 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
引用
收藏
页数:6
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