Accurate measurement of flatness of etalons

被引：0

作者：

Itoh, S ^{[1
]}

Katoh, K ^{[1
]}

Oikawa, T ^{[1
]}

Chen, J ^{[1
]}

机构：

[1] Tokyo Kogei Univ, Tokyo Inst Polytech, Fac Engn, Atsugi, Kanagawa 2430297, Japan

来源：

OPTICAL ENGINEERING FOR SENSING AND NANOTECHNOLOGY (ICOSN'99) | 1999年 / 3740卷

关键词：

etalon interference; accurate measurement; two-dimensional flatness;

D O I：

10.1117/12.347756

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The method of measurement of two-dimensional flatness of etalons are proposed. Fundamental idea is to measure diameters of interference rings produced on CCD camera. The reproducibility is about lambda/1800.

引用

页码：606 / 609

页数：4