Polymers in nanotechnology

被引：48
作者：
Li, HW [1 ]
Huck, WTS [1 ]
机构：
[1] Univ Cambridge, Dept Chem, Melville Lab Polymer Synthesis, Cambridge CB2 3RA, England
来源：
CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE | 2002年 / 6卷 / 01期
基金：
英国工程与自然科学研究理事会;
关键词：
polymers; nanotechnology; nanoimprint lithography; microphase separation;
D O I：
10.1016/S1359-0286(02)00008-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The natural length scales of polymer chains and their morphologies in the bulk, which lie in the nanometer domain, make polymers ideal building blocks for nanotechnology. In this review we will discuss a number of recent developments in the use of polymers for the fabrication of nanostructures via lithographic and self-assembling strategies. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：3 / 8
页数：6
相关论文
共 58 条
[1]   Conformal contact and pattern stability of stamps used for soft lithography [J].
Bietsch, A ;
Michel, B .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (07) :4310-4318
[2]   Surface-induced structure formation of polymer blends on patterned substrates [J].
Böltau, M ;
Walheim, S ;
Mlynek, J ;
Krausch, G ;
Steiner, U .
NATURE, 1998, 391 (6670) :877-879
[3]   157 nm resist materials: Progress report [J].
Brodsky, C ;
Byers, J ;
Conley, W ;
Hung, R ;
Yamada, S ;
Patterson, K ;
Somervell, M ;
Trinque, B ;
Tran, HV ;
Cho, S ;
Chiba, T ;
Lin, SH ;
Jamieson, A ;
Johnson, H ;
Vander Heyden, T ;
Willson, CG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3396-3401
[4]   FABRICATION OF SUB-10 NM STRUCTURES BY LIFT-OFF AND BY ETCHING AFTER ELECTRON-BEAM EXPOSURE OF POLY(METHYLMETHACRYLATE) RESIST ON SOLID SUBSTRATES [J].
CHEN, W ;
AHMED, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06) :2519-2523
[5]   Lithographically induced self-construction of polymer microstructures for resistless patterning [J].
Chou, SY ;
Zhuang, L ;
Guo, LJ .
APPLIED PHYSICS LETTERS, 1999, 75 (07) :1004-1006
[6]   Imprint lithography with 25-nanometer resolution [J].
Chou, SY ;
Krauss, PR ;
Renstrom, PJ .
SCIENCE, 1996, 272 (5258) :85-87
[7]   Sub-10 nm imprint lithography and applications [J].
Chou, SY ;
Krauss, PR ;
Zhang, W ;
Guo, LJ ;
Zhuang, L .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06) :2897-2904
[8]   IMPRINT OF SUB-25 NM VIAS AND TRENCHES IN POLYMERS [J].
CHOU, SY ;
KRAUSS, PR ;
RENSTROM, PJ .
APPLIED PHYSICS LETTERS, 1995, 67 (21) :3114-3116
[9]  
Clark SL, 1998, ADV MATER, V10, P1515, DOI 10.1002/(SICI)1521-4095(199812)10:18<1515::AID-ADMA1515>3.0.CO
[10]  
2-E
123456