Zone-plate-based scanning photoelectron microscopy at SRRC: Performance and applications

被引:27
作者
Klauser, R
Hong, IH
Lee, TH
Yin, GC
Wei, DH
Tsang, KL
Gwo, S
机构
[1] Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan
[2] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 106, Taiwan
[3] Acad Sinica, Inst Atom & Mol Sci, Taipei 106, Taiwan
[4] Natl Tsing Hua Univ, Dept Phys, Hsinchu 300, Taiwan
[5] Univ Heidelberg, D-69120 Heidelberg, Germany
[6] Chung Yuan Christian Univ, Dept Biomed Engn, Tao Yuan 32023, Taiwan
关键词
D O I
10.1142/S0218625X0200180X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Adapting classical spectroscopic methods to the new challenge of studying nanomaterials, imaging techniques are the trendsetter in recent years. Among them is scanning photoelectron microscopy (SPEM) with submicron spatial resolution, where the sample surface is raster-scanned by a focused soft X-ray beam, and the emitted photoelectrons are collected at each point by the input optics of an electron energy analyzer. We have constructed such a station at SRRC in Taiwan, which is now fully in operation. In this paper, we introduce the specific features of the instrument and discuss application examples on the characterization of scanning-probe-induced Si(3)N(4) to SiO(x) conversion and electron- and plasma-induced chemical changes in alkanethiols self-assembled monolayers. In combining two-dimensional imaging and micro-photoemission, SPEM can reveal valuable information on the chemical and electronic properties of structured and multiphase materials.
引用
收藏
页码:213 / 222
页数:10
相关论文
共 25 条
  • [1] X-RAY SPECTROMICROSCOPY WITH A ZONE PLATE GENERATED MICROPROBE
    ADE, H
    KIRZ, J
    HULBERT, SL
    JOHNSON, ED
    ANDERSON, E
    KERN, D
    [J]. APPLIED PHYSICS LETTERS, 1990, 56 (19) : 1841 - 1844
  • [2] ADE H, 1997, J ELECT SPECTROSC RE, V84
  • [3] Nanometre-scale oxidation of silicon surfaces by dynamic force microscopy:: reproducibility, kinetics and nanofabrication
    Calleja, M
    Anguita, J
    García, R
    Birkelund, K
    Pérez-Murano, F
    Dagata, JA
    [J]. NANOTECHNOLOGY, 1999, 10 (01) : 34 - 38
  • [4] Nanometer-scale conversion of Si3N4 to SiOx
    Chien, FSS
    Chang, JW
    Lin, SW
    Chou, YC
    Chen, TT
    Gwo, S
    Chao, TS
    Hsieh, WF
    [J]. APPLIED PHYSICS LETTERS, 2000, 76 (03) : 360 - 362
  • [5] Nano-oxidation of silicon nitride films with an atomic force microscope: Chemical mapping, kinetics, and applications
    Chien, FSS
    Chou, YC
    Chen, TT
    Hsieh, WF
    Chao, TS
    Gwo, S
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 89 (04) : 2465 - 2472
  • [6] Surface chemistry: from vibrational spectroscopy to photoemission spectromicroscopy
    Chuang, TJ
    Chan, YL
    Chuang, P
    Klauser, R
    Ko, CH
    Wei, DH
    [J]. APPLIED SURFACE SCIENCE, 2001, 169 : 1 - 10
  • [7] Local atomic environment of Si suboxides at the SiO2/Si(111) interface determined by angle-scanned photoelectron diffraction
    Dreiner, S
    Schürmann, M
    Westphal, C
    Zacharias, H
    [J]. PHYSICAL REVIEW LETTERS, 2001, 86 (18) : 4068 - 4071
  • [8] Eck W, 2000, ADV MATER, V12, P805, DOI 10.1002/(SICI)1521-4095(200006)12:11<805::AID-ADMA805>3.0.CO
  • [9] 2-0
  • [10] Electron-induced crosslinking of aromatic self-assembled monolayers:: Negative resists for nanolithography
    Geyer, W
    Stadler, V
    Eck, W
    Zharnikov, M
    Gölzhäuser, A
    Grunze, M
    [J]. APPLIED PHYSICS LETTERS, 1999, 75 (16) : 2401 - 2403