Diamond-like carbon (DLC) films deposited on copper substrate through preparation of intermediate layers

Diamond-like carbon (DLC) films were prepared on copper substrate through preparation of intermediate layers by combined plasma enhanced sputtering physical vapor deposition and microwave electron cyclotron resonance plasma enhanced chemical vapor deposition techniques. Raman spectroscopy indicated that the films had amorphous structure and typical characteristic of DLC film. With the increase of deposition bias voltage, D and G band both shifted to high wave-number and I-D/I-G increased gradually. The morphology was characterized by atomic force microscopy (AFM) and the results indicated that the films were dense and homogeneous, and the roughness of the films decreased with the increase of the deposition bias voltage. Hardness and modulus of DLC were measured by the nanoindentation.