Refractive index variation of amorphous Ta2O5 film fabricated by ion beam sputtering with RF bias power

被引：10

作者：

Huang, Chen Yang ^{[1
,2
]}

Ku, Hao Min ^{[1
]}

Tsai, Yi Ping ^{[1
]}

Chen, Wei Kai ^{[1
]}

Chao, Shiuh ^{[1
]}

机构：

[1] Natl Tsing Hua Univ, Inst Photon Technol, Hsinchu 30013, Taiwan

[2] Ind Technol Res Inst, Hsinchu 31040, Taiwan

来源：

OPTICAL REVIEW | 2009年 / 16卷 / 03期

关键词：

tantalum pentoxide; ion beam sputtering; RF bias power; refractive index; COMPOSITE THIN-FILMS; OPTICAL-PROPERTIES;

D O I：

10.1007/s10043-009-0051-2

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Ta2O5 film was fabricated by ion beam sputtering with RF bias applied to the substrate. The refractive index in the visible range of the film can be controlled to vary linearly with the RF bias power while low absorption is maintained.

引用

页码：274 / 275

页数：2

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