Optimization of multilayer antireflection coating for photovoltaic applications

被引：38

作者：

Sikder, Urmita ^{[1
]}

Zaman, Mohammad Asif ^{[2
]}

机构：

[1] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA

[2] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA

来源：

OPTICS AND LASER TECHNOLOGY | 2016年 / 79卷

关键词：

Antireflection coating; Photovoltaics; Transfer matrix analysis; Differential evolution; SILICON SOLAR-CELLS; INCOHERENT INTERFERENCE; GENETIC ALGORITHM; DESIGN; SYSTEMS; COHERENT; JUNCTION; DEVICES;

D O I：

10.1016/j.optlastec.2015.11.011

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Multilayer antireflection coating (ARC) for photovoltaics is optimized using Differential Evolution (DE) algorithm. A general transfer-matrix based mathematical formulation is used for evaluating reflection spectra of the system. Exact and complete values of refractive indices are used in the analysis to provide higher accuracy of the results. The proposed optimization method takes into account the solar irradiance spectra, absorption characteristics of semiconductors and angle of incidence to maximize efficiency. This method is found to reduce the average reflectance for a wide range of angles of incidence. The proposed method is used to design ARC for silicon solar cell and a multi junction AlGaAs/GaAs/Ge solar cell. Finally, comparative analysis of different ARC designs is provided in terms of corresponding solar cell characteristics. (C) 2015 Elsevier Ltd. All rights reserved.

引用

页码：88 / 94

页数：7

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