Devitrification of ultrafast laser plasma produced metastable glass layer

被引:4
作者
Chandrappan, Jayakrishnan [1 ]
Khetan, Vishal [2 ]
Ward, Michael [3 ]
Murray, Matthew [1 ]
Jose, Gin [1 ]
机构
[1] Univ Leeds, Sch Chem & Proc Engn, Leeds LS2 9JT, W Yorkshire, England
[2] Univ Leeds, Sch Mech Engn, Leeds LS2 9JT, W Yorkshire, England
[3] Univ Leeds, Leeds Electron Microscopy & Spect Ctr, Leeds LS2 9JT, W Yorkshire, England
基金
英国工程与自然科学研究理事会;
关键词
Erbium doped silicate; Ultrafast laser; Optical materials; Optical amplifiers; SILICON PHOTONICS; ERBIUM; AMPLIFIERS;
D O I
10.1016/j.scriptamat.2016.12.028
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Erbium-doped tellurite modified silica (EDTS) is a newly formulated silicate glass that has the potential to realize on-chip optical amplifiers. The devitrification process of EDTS layer on host silica glass has been studied in the temperature range 300 degrees C-1000 degrees C. In-situ high-temperature X-ray diffraction, selective area electron diffraction and high-resolution transmission electron microscopy revealed the amorphous phase of EDTS as-fabricated up to 600 degrees C and rapid irreversible crystalline phase developments above 600 degrees C, contrasting the host silica. Distinct structural evolutions of EDTS with the variation in temperature were observed, including a complete evaporation of TeO2 at 800 degrees C from the matrix. (C) 2017 The Authors. Published by Elsevier Ltd on behalf of Acta Materialia Inc.
引用
收藏
页码:37 / 41
页数:5
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