A study on vacancy-type defects in the electroless Cu measured with a monoenergetic positron beam

被引：6
|
作者：
Yamanaka, Kimihiro [1 ]
Uedono, Akira [2 ]
机构：
[1] Kyocera SLC Technol Corp, Adv Packaging Lab, Shiga 5202362, Japan
[2] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
来源：
SCRIPTA MATERIALIA | 2009年 / 61卷 / 01期
关键词：
Electroless Cu; Positron annihilation; Vacancy-type defect; LIFETIME SPECTROSCOPY; ELECTROPLATED CU; EQUILIBRIUM VACANCIES; ANNIHILATION; COPPER; METALS; FILMS; FE;
D O I：
10.1016/j.scriptamat.2009.02.006
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Vacancy-type defects in electroless Cu were investigated using both positron annihilation technologies and secondary ion mass spectroscopy. The density of vacancy-type defects in electroless Cu was greater than that in electrolytic Cu. The defects were vacancy-impurity complexes; the open volume of such defects was similar to that of superposition of small vacancy clusters and divacancy. No other major vacancy-type defect was observed at the interface between electroless Cu and the subsequent electrolytic Cu. (c) 2009 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：8 / 11
页数：4
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