Thermal considerations in design of vertically integrated Si/GaN/SiC multichip modules

被引:4
作者
Anderson, T. J. [1 ]
Ren, F.
Covert, L.
Lin, J.
Pearton, S. J.
机构
[1] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Elect & Comp Engn, Gainesville, FL 32611 USA
[3] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
关键词
D O I
10.1149/1.2234734
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The thermal design of vertically integrated multichip modules (MCMs) based on GaN high electron mobility transistor (HEMT) power amplifiers (PAs) on SiC substrates with back-side heat-sink/antenna and Si modulators bonded to the common ground plane and PA chip using polydimethylsolixane (PDMS) is reported. The heat transfer in the integrated structure was estimated using finite element simulation for different PA power density, HEMT gate finger pitch, Si thickness, the presence or absence of the PDMS layer, and the thickness of dielectric isolation interlayers. The maximum temperature in the integrated antenna approach occurs near the gates of the HEMTs and hence the gate pitch has a strong effect on the temperature distribution. The presence of the PMDS has a major effect on the operating temperature of the PA and Si modulator, especially at high power densities, and also influences the temperature distribution within the MCM. (c) 2006 The Electrochemical Society.
引用
收藏
页码:G906 / G910
页数:5
相关论文
共 26 条
[21]   Large-signal linearity in III-N MOSDHFETs [J].
Tarakji, A ;
Fatima, H ;
Hu, X ;
Zhang, JP ;
Simin, G ;
Khan, MA ;
Shur, MS ;
Gaska, R .
IEEE ELECTRON DEVICE LETTERS, 2003, 24 (06) :369-371
[22]   Investigation of the impact of Al mole-fraction on the consequences of RF stress on AlxGa1-xN/GaN MODFETs [J].
Valizadeh, P ;
Pavlidis, D .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2005, 52 (09) :1933-1939
[23]   Contact resistivity and transport mechanisms in W contacts to p- and n-GaN [J].
Zeitouny, A ;
Eizenberg, M ;
Pearton, SJ ;
Ren, F .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (04) :2048-2053
[24]   Correlation of device performance and defects in AlGaN/GaN high-electron mobility transistors [J].
Zhang, AP ;
Rowland, LB ;
Kaminsky, EB ;
Tilak, V ;
Grande, JC ;
Teetsov, J ;
Vertiatchikh, A ;
Eastman, LF .
JOURNAL OF ELECTRONIC MATERIALS, 2003, 32 (05) :388-394
[25]   9.2W/mm (13.8W) AlGaN/GaN HEMTs at 10 GHz and 55 V drain bias [J].
Zhang, AP ;
Rowland, LB ;
Kaminsky, EB ;
Tucker, JB ;
Kretchmer, JW ;
Allen, AF ;
Cook, J ;
Zhang, AP .
ELECTRONICS LETTERS, 2003, 39 (02) :245-247
[26]   Thermal conductivity of GaN films: Effects of impurities and dislocations [J].
Zou, J ;
Kotchetkov, D ;
Balandin, AA ;
Florescu, DI ;
Pollak, FH .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (05) :2534-2539