The elimination of the 'artifact' in the electrostatic force measurement using a novel noncontact atomic force micro scope/electrostatic force microscope

被引：47
作者：
Okamoto, K
Sugawara, Y
Morita, S
机构：
[1] Osaka Univ, Low Temp Ctr, Suita, Osaka 5650871, Japan
[2] Osaka Univ, Dept Elect Engn, Suita, Osaka 5650871, Japan
来源：
APPLIED SURFACE SCIENCE | 2002年 / 188卷 / 3-4期
关键词：
noncontact atomic force microscopy; Kelvin probe force microscopy; FM detection; atomic resolution; electrostatic force measurement; ultrahigh vacuum;
D O I：
10.1016/S0169-4332(01)00953-9
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We investigate the 'artifact' included in Kelvin probe force microscopy (KPFM). We theoretically show that the artifact due to the applied AC field cannot be canceled by conventional KPFM and that the artifact signal can be detected from the force signal through the second harmonic component of AC field. We made an experiment to simultaneously obtain the topography, the spatial distribution of the surface potential and the artifact signal on Si(1 1 1) surface using our noncontact atomic force microscope (NC-AFM). The result indicates that topography includes the artifact signal and that the surface potential image reflects the charge density of Si adatoms. We propose the novel method to completely eliminate the artifact due to the electrostatic force. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：381 / 385
页数：5
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