In-situ x-ray diffraction study of the growth of highly strained epitaxial BaTiO3 thin films

被引：19

作者：

Sinsheimer, J. ^{[1
]}

Callori, S. J. ^{[1
]}

Ziegler, B. ^{[1
]}

Bein, B. ^{[1
]}

Chinta, P. V. ^{[2
]}

Ashrafi, A. ^{[2
]}

Headrick, R. L. ^{[2
]}

Dawber, M. ^{[1
]}

机构：

[1] SUNY Stony Brook, Dept Phys & Astron, Stony Brook, NY 11794 USA

[2] Univ Vermont, Dept Phys, Burlington, VT 05405 USA

来源：

APPLIED PHYSICS LETTERS | 2013年 / 103卷 / 24期

基金：

美国国家科学基金会;

关键词：

CRITICAL THICKNESS; FERROELECTRICITY; ENHANCEMENT;

D O I：

10.1063/1.4848779

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In-situ synchrotron x-ray diffraction was performed during the growth of BaTiO3 thin films on SrTiO3 substrates using both off-axis RF magnetron sputtering and pulsed laser deposition techniques. It was found that the films were ferroelectric during the growth process, and the presence or absence of a bottom SrRuO3 electrode played an important role in the growth of the films. Pulsed laser deposited films on SrRuO3 displayed an anomalously high tetragonality and unit volume, which may be connected to the previously predicted negative pressure phase of BaTiO3. (C) 2013 AIP Publishing LLC.

引用

页数：4

共 19 条

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