Influence of Device Parameter Variability on Current Sharing of Parallel-Connected SiC MOSFETs

被引:0
作者
Nakamura, Yohei [1 ,3 ]
Kuroda, Naotaka [1 ]
Yamaguchi, Atsushi [1 ]
Nakahara, Ken [1 ]
Shintani, Michihiro [2 ]
Sato, Takashi [3 ]
机构
[1] ROHM Co Ltd, Res & Dev Ctr, Ukyo Ku, Mizosaki Cho, Kyoto 6158585, Japan
[2] Nara Inst Sci & Technol, Grad Sch Sci & Technol, 8916-5 Takayama Cho, Ikoma, Nara 6300192, Japan
[3] Kyoto Univ, Grad Sch Informat, Sakyo Ku, Yoshida Hon Machi, Kyoto 6068501, Japan
来源
2020 IEEE 29TH ASIAN TEST SYMPOSIUM (ATS) | 2020年
关键词
Silicon Carbide(SiC); MOSFET; device modeling; statistical simulation; parallel connection;
D O I
10.1109/ats49688.2020.9301592
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
In this paper, impact of device parameter variation on current sharing between silicon carbide (SiC) metal-oxide-semiconductor field-effect transistors (MOSFETs) connected in parallel has been studied via Monte Carlo simulation. Paralleled MOSFETs driving an inductive load in a switching circuit, which are expressed by using a surface-potential-based SiC MOSFET model, have been analyzed. From the simulation results, dominant device parameters that affect the mismatch in the SiC MOSFET currents are identified. We also evaluate the effect of current mismatch on the energy loss imbalance. In our analysis, the model parameters related to flat-band voltage, channel length modulation, and current gain factor are found to be particularly important.
引用
收藏
页码:120 / 125
页数:6
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