Towards ultra-thin plasmonic silicon wafer solar cells with minimized efficiency loss

被引:91
作者
Zhang, Yinan [1 ]
Stokes, Nicholas [1 ]
Jia, Baohua [1 ]
Fan, Shanhui [2 ]
Gu, Min [1 ]
机构
[1] Swinburne Univ Technol, Fac Sci Engn & Technol, Ctr Microphoton, Hawthorn, Vic 3122, Australia
[2] Stanford Univ, Dept Elect Engn, Ginzton Lab, Stanford, CA 94305 USA
来源
SCIENTIFIC REPORTS | 2014年 / 4卷
关键词
RECOMBINATION; ENHANCEMENT; THICKNESS; FILM;
D O I
10.1038/srep04939
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
The cost-effectiveness of market-dominating silicon wafer solar cells plays a key role in determining the competiveness of solar energy with other exhaustible energy sources. Reducing the silicon wafer thickness at a minimized efficiency loss represents a mainstream trend in increasing the cost-effectiveness of wafer-based solar cells. In this paper we demonstrate that, using the advanced light trapping strategy with a properly designed nanoparticle architecture, the wafer thickness can be dramatically reduced to only around 1/10 of the current thickness (180 mm) without any solar cell efficiency loss at 18.2%. Nanoparticle integrated ultra-thin solar cells with only 3% of the current wafer thickness can potentially achieve 15.3% efficiency combining the absorption enhancement with the benefit of thinner wafer induced open circuit voltage increase. This represents a 97% material saving with only 15% relative efficiency loss. These results demonstrate the feasibility and prospect of achieving high- efficiency ultra-thin silicon wafer cells with plasmonic light trapping.
引用
收藏
页数:6
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