p-Type Doping of GaSb by Beryllium Grown on GaAs (001) Substrate by Molecular Beam Epitaxy

被引:5
作者
Benyahia, Djalal [1 ]
Kubiszyn, Lukasz [2 ]
Michalczewski, Krystian [1 ]
Keblowski, Artur [2 ]
Martyniuk, Piotr [1 ]
Piotrowski, Jozef [2 ]
Rogalski, Antoni [1 ]
机构
[1] Mil Univ Technol, Inst Appl Phys, PL-00908 Warsaw, Poland
[2] Vigo Syst SA, PL-05850 Ozarow Mazowiecki, Poland
关键词
Molecular beam epitaxy; GaSb; doping; high resolution Xray diffraction; semiconducting III-V materials;
D O I
10.5573/JSTS.2016.16.5.695
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Be-doped GaSb layers were grown on highly mismatched semi-insulating GaAs substrate (001) with 2 degrees offcut towards < 110 > at low growth temperature, by molecular beam epitaxy (MBE). The influence of Be doping on the crystallographic quality, surface morphology, and electrical properties, was assessed by X-ray diffraction, Nomarski microscopy, and Hall effect measurements, respectively. Be impurities are well behaved acceptors with hole concentrations as high as 9x10(17) cm(-3). In addition, the reduction of GaSb lattice parameter with Be doping was studied.
引用
收藏
页码:695 / 701
页数:7
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