Sub-micron ablation of metallic thin film by femtosecond pulse laser

被引:31
|
作者
Venkatakrishnan, K [1 ]
Tan, B [1 ]
Sivakumar, NR [1 ]
机构
[1] Nanyang Technol Univ, Sch Mech & Prod Engn, Precis Engn & Nanotechnol Ctr, Singapore 639798, Singapore
来源
OPTICS AND LASER TECHNOLOGY | 2002年 / 34卷 / 07期
关键词
femtosecond pulsed laser; ablation;
D O I
10.1016/S0030-3992(02)00074-9
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The ability to machine very small features in a material has a wide range of applications in industry. We ablated holes into thin film of 100 nm thickness made from various metals by femtosecond pulsed laser ablation. Using a Ti:Sapphire laser which supplies a laser pulse of 150 fs duration at central spectrum wavelength of 400 nm, we have produced a series sub-micron holes, whose diameters are less than 200 nm with a focused laser spot of 1.7 mum. We found that the material damage threshold has a great influence on the quality of the produced features. Experimental results shows that the heat-affected zone and the degree of being affected reduce with the increase of threshold value. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:575 / 578
页数:4
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