Simulation of large-scale silicon melt flow in magnetic Czochralski growth

被引:54
|
作者
Savolainen, V
Heikonen, J
Ruokolainen, J
Anttila, O
Laakso, M
Paloheimo, J
机构
[1] CSC Sci Comp Ltd, FIN-02101 Espoo, Finland
[2] Okmet Oyj, FIN-01301 Vantaa, Finland
关键词
fluid flows; magnetic fields; finite element method; residual-free bubbles; Czochralski method; magnetic field assisted Czochralski method; semiconducting silicon;
D O I
10.1016/S0022-0248(02)01441-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have modeled the silicon melt flow and temperature as well as the applied and induced magnetic fields in a largescale, cylindrically symmetric Czochralski crystal growth system. The validity of a cylindrically symmetric model is evaluated by comparing melt flow simulations to previously published three-dimensional simulations and experimental measurements in identical setups. The applied magnetic field, due to a given external magnet configuration and its current distribution, is first solved. Subsequently, the coupled magnetohydrodynamical system, i.e., the Navier-Stokes, heat and induction equations, is solved in the melt region. The mathematical model is discretized by the finite element method. The numerical methods used are explained in this article. The applied external magnetic fields we have considered are time-independent and axisymmetric. The magnetohydrodynamical problem is time-dependent, and the velocity and the induced magnetic field have azimuthal components. The velocity distributions and temperature time series for various cusp-type fields are compared. It is found that a magnetic field of the order of 25 mT strongly damps the temperature oscillations in the melt outside about half the crucible radius. A higher field of about 100 mT stabilizes the flow in most of the melt. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:243 / 260
页数:18
相关论文
共 50 条
  • [2] COMPUTATIONAL SIMULATION OF MELT FLOW IN MAGNETIC CZOCHRALSKI GROWTH-PROCESS
    LEE, HM
    LEE, KJ
    HAHN, SY
    KOREAN JOURNAL OF CHEMICAL ENGINEERING, 1989, 6 (02) : 105 - 111
  • [3] Time-dependent behavior of melt flow in the industrial scale silicon Czochralski growth with a transverse magnetic field
    Yokoyama, R.
    Nakamura, T.
    Sugimura, W.
    Ono, T.
    Fujiwara, T.
    Kakimoto, K.
    JOURNAL OF CRYSTAL GROWTH, 2019, 519 : 77 - 83
  • [4] Model experiments for melt flow in Czochralski growth of silicon
    Paetzold, O.
    Dadzis, K.
    Kirmse, C.
    Weik, D.
    Buettner, L.
    Czarske, J.
    Charitos, A.
    JOURNAL OF CRYSTAL GROWTH, 2022, 588
  • [5] Three-dimensional simulation of silicon melt flow in electromagnetic Czochralski crystal growth
    Wang, W
    Watanabe, M
    Hibiya, T
    Tanahashi, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (2A): : 372 - 377
  • [7] COMPUTATIONAL SIMULATION OF MELT FLOW DURING CZOCHRALSKI GROWTH
    KOBAYASHI, N
    JOURNAL OF CRYSTAL GROWTH, 1978, 43 (03) : 357 - 363
  • [8] CZOCHRALSKI BULK FLOW OF SILICON AT LARGE MELT ASPECT RATIO
    LANGLOIS, WE
    JOURNAL OF CRYSTAL GROWTH, 1983, 63 (01) : 67 - 69
  • [9] Three dimensional simulation of melt flow in Czochralski crystal growth with steady magnetic fields
    Cen, Xianrong
    Li, Y. S.
    Zhan, Jiemin
    JOURNAL OF CRYSTAL GROWTH, 2012, 340 (01) : 135 - 141
  • [10] Effect of cusp magnetic field on the turbulent melt flow and crystal/melt interface during large-size Czochralski silicon crystal growth
    Ding, Junling
    Li, Yuqing
    Liu, Lijun
    INTERNATIONAL JOURNAL OF THERMAL SCIENCES, 2021, 170