Preparation of Bi:TiO2 thin films by an hybrid deposition configuration: pulsed laser deposition and thermal evaporation

被引：8

作者：

Escobar-Alarcon, L. ^{[1
]}

Solis-Casados, D. A. ^{[2
]}

Perez-Alvarez, J. ^{[1
]}

Romero, S. ^{[1
]}

Morales-Mendez, J. G. ^{[3
]}

Haro-Poniatowski, E. ^{[3
]}

机构：

[1] Inst Nacl Invest Nucl, Dept Fis, Mexico City 11801, DF, Mexico

[2] Ctr Conjunto Invest Quim Sustentable UAEM UNAM, Unidad San Cayetano, Toluca 50200, Estado De Mexic, Mexico

[3] Univ Autonoma Metropolitana Iztapalapa, Dept Fis, Mexico City 09340, DF, Mexico

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2014年 / 117卷 / 01期

关键词：

TIO2;

D O I：

10.1007/s00339-014-8276-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The aim of this work was to report the application of an hybrid deposition configuration to deposit Titanium dioxide (TiO2) thin films modified with different amounts of bismuth (Bi:TiO2). The samples were synthesized combining a TiO2 laser ablation plasma with a flux of vapor of bismuth produced by thermal evaporation. By varying the deposition rate of Bi it was possible to control the amount of Bi incorporated in the film and consequently the film properties. A detailed compositional, structural, and optical characterization by XPS, RBS, Raman spectroscopy, and UV-Vis spectrometry techniques is discussed. Photocatalytic response of the deposited thin films was studied through the degradation of a malachite green solution.

引用

页码：31 / 35

页数：5

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