Combinatorial Approach for Single-Crystalline TaON Growth: Epitaxial β-TaON (100)/α-Al2O3 (012)

被引:7
作者
Narayanachari, K. V. L. V. [1 ]
Buchholz, D. Bruce [1 ]
Goldfine, Elise A. [1 ]
Wenderott, Jill K. [1 ]
Haile, Sossina M. [1 ]
Bedzyk, Michael J. [1 ,2 ]
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Northwestern Univ, Dept Phys & Astron, Evanston, IL 60208 USA
基金
美国国家科学基金会;
关键词
beta-TaON; combinatorial synthesis; thin film; PLD; XRD; machine learning; TANTALUM-OXYNITRIDE; METASTABLE POLYMORPH; WATER; PHOTOCATALYST; PHOTOANODES; TA2O5; CONVERSION; EVOLUTION;
D O I
10.1021/acsaelm.0c00622
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The photocatalyst beta-TaON is of interest due to promising properties, such as stability, suitable band gap for visible light, and carrier mobility. We implemented a combinatorial, material discovery approach that used pulsed laser deposition (PLD) for thin-film growth, X-ray diffraction (XRD) for phase determination, and machine learning for data reduction. A lateral compositional gradient of TaOxNy was grown across the surface of an alpha-Al2O3 (012) wafer. After annealing, XRD scattering patterns were collected across the lateral gradient. Unsupervised machine learning separated the XRD data into four clusters (phases); one of which turned out to be the desired monoclinic beta-TaON phase. Using high-resolution XRD, we determined that the beta-TaON region of the film was a 260 angstrom thick single-crystal epitaxial with the substrate, having out-of-plane beta-TaON (100)//alpha-Al2O3 (012) and in-plane beta-TaON (010)//alpha-Al2O3 (2 (1) over bar0). X-ray reflectivity (XRR) analysis of the beta-TaON region of the film showed an electron density matching that expected for beta-TaON. X-ray photoelectron spectroscopy (XPS) showed a Ta5+ valence state in the beta-TaON region of the film. This combinatorial approach, which produces a library of phases on a single wafer, proved to be very efficient for the growth of a material's phase of interest.
引用
收藏
页码:3571 / 3576
页数:6
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