A Multi-frequency Megasonic System for Nano-particle Removal

被引：0

作者：

Kim, Hyunse ^{[1
]}

Lee, Yanglae ^{[1
]}

Lim, Euisu ^{[1
]}

机构：

[1] Korea Inst Machinery & Mat, Extreme Mech Engn Res Div, Taejon 305343, South Korea

来源：

SEMICONDUCTOR CLEANING SCIENCE AND TECHNOLOGY 13 (SCST 13) | 2013年 / 58卷 / 06期

关键词：

WAVE-GUIDE; FABRICATION; DESIGN;

D O I：

10.1149/05806.0029ecst

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A multi-frequency megasonic system for nano-particle removal was developed. In design process, finite element analysis was performed and anti-resonance frequency for 1 MHz actuating, was predicted as 995 kHz with 0.5% error compared with the measured value of 1000 kHz. In addition, anti-resonance frequency of 2998 kHz was obtained for 3 MHz, which coincided with the measured value. For the verification of the system performance, acoustic pressures of the developed waveguide were measured and compared with a commercial megasonic system. The result revealed that the developed one can show relatively better distributions. To assess cleaning ability, particle removal efficiency (PRE) tests were processed and 56.1% PRE improvement was achieved compared with a conventional product. Considering these results, the developed system can be applied to nano-particle cleaning process with higher efficiency.

引用

页码：29 / 35

页数：7

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