Doping induced surface chemistry dictating the characteristics of Schottky contacts to III-V nitride semiconductors

被引:1
作者
Alam, J.
Mohammad, S. Noor
机构
[1] Howard Univ, Mat Sci Res Ctr Excellence, Washington, DC 20059 USA
[2] Howard Univ, Dept Elect & Comp Engn, Washington, DC 20059 USA
[3] Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20742 USA
关键词
D O I
10.1063/1.2220563
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
While lightly doped semiconductors are preferred for Schottky contacts, heavily doped semiconductors are preferred for Ohmic contacts. The upper limit of doping for Schottky contacts and the lower limit of doping for Ohmic contacts have not, however, been quantified. To address this problem, the influence of doping induced surface chemistry on the electrical characteristics of Schottky diodes has been studied. Hall measurement, current-voltage measurements, and transmission electron microscopy have been performed. The most remarkable observation of the study is a relationship between the surface dislocation density and the ideality factor of the Schottky diodes. The observation leads to a conclusion that the upper limit of the semiconductor doping for Schottky diodes should be such that it leads to negligible barrier height reduction without the creation of excessive surface dislocation density. (c) 2006 American Institute of Physics.
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页数:8
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