Fast Response (7.6s) Acetone Sensing by InGaN/GaN on Si (111) at 373 K

被引:12
作者
Das, Subhashis [1 ]
Bag, Ankush [2 ]
Kumar, Rahul [1 ]
Biswas, Dhrubes [3 ]
机构
[1] IIT Kharagpur, Adv Technol Dev Ctr, Kharagpur 721302, W Bengal, India
[2] IIT Mandi, Sch Comp & Elect Engn, Mandi 175005, Himachal Prades, India
[3] IIT Kharagpur, Dept Elect & Elect Commun Engn, Kharagpur 721302, W Bengal, India
关键词
Fast response; acetone sensor; InGaN/GaN; resistive device; GAS SENSOR; CRITICAL THICKNESS; THIN-FILM; TEMPERATURE; DIODES;
D O I
10.1109/LED.2017.2647831
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new and exciting resistive gas sensor based on Ni/InGaN/GaN heterostructure, grown by plasma assisted molecular beam epitaxy, has been developed to efficiently detect acetone very rapidly at low temperature. Non-rectifying I-V characteristics of epitaxially relaxed InGaN with Ni contact have been revealed at 373 K. An incremental current of 11.74 mu A has been found at 373 K with the exposure of 100 ppm of acetone vapor at an operating bias of 0.4 V. Sensitivity has been obtained from transient response curves. Most importantly, very fast response/recovery characteristics with good baseline recovery have been witnessed. The response time and recovery time have been found to be similar to 7.6-8.4 s and similar to 4.5-19.1 s. A possible explanation, including Langmuir adsorption-desorption isotherm, has also been discussed.
引用
收藏
页码:383 / 386
页数:4
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