Electron-beam-generated plasmas for materials processing

被引：60

作者：

Walton, SG ^{[1
]}

Muratore, C ^{[1
]}

Leonhardt, D ^{[1
]}

Fernsler, RF ^{[1
]}

Blackwell, DD ^{[1
]}

Meger, RA ^{[1
]}

机构：

[1] USN, Res Lab, Div Plasma Phys, Washington, DC 20375 USA

来源：

SURFACE & COATINGS TECHNOLOGY | 2004年 / 186卷 / 1-2期

关键词：

C] PIII; C] nitriding; C] PACVD; C] PAPVD; X] electron beam produced;

D O I：

10.1016/j.surfcoat.2004.04.007

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The results of investigations aimed at characterizing pulsed, electron-beam-produced plasmas for use in materials processing applications are discussed. In situ diagnostics of the bulk plasma and at the plasma/surface interface are reported for plasmas produced in Ar, N-2, and mixtures thereof Langmuir probes were employed to determine the local electron temperature, plasma density, and plasma potential within the plasma, while ion energy analysis and mass spectrometry were used to interrogate the ion flux at an electrode located adjacent to the plasma. The results illustrate the unique capabilities of electron-beam-produced plasmas and the various parameters available to optimize operating conditions for applications such as nitriding, etching, and thin film deposition. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：40 / 46

页数：7

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