SiGe heterojunction bipolar transistors - The noise perspective

被引:12
|
作者
Schumacher, H
Erben, U
Durr, W
机构
[1] Dept. of Electron Devices and Circt., University of Ulm
关键词
D O I
10.1016/S0038-1101(97)00094-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Si/SiGe heterojunction transistors with high germanium concentration in the base layer are capable of microwave noise figures below 1 dB at X-band frequencies, because of their low base resistance. We review critical device parameters which influence the minimum noise figure, location of the noise-optimum source reflection coefficient, and associated gain at noise match, including both low-parasitic double-mesa and highly manufacturable box-shaped HBT devices in our considerations. A higher associated gain can be obtained when the base-collector feedback capacitance is reduced. Using larger transistors, both the magnitude of the noise-optimum source reflection coefficient and the equivalent noise resistance will be reduced, making input matching easier and less lossy. Low-frequency noise results show 1/f corner frequencies below 1 kHz in microwave devices. Two circuit examples, a d.c.-18 GHz amplifier and a low-noise active antenna at 5.8 GHz, demonstrate that device capabilities can be translated into superior circuit performance. (C) 1997 Elsevier Science Ltd.
引用
收藏
页码:1485 / 1492
页数:8
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