Low temperature deposited graphene by surface wave plasma CVD as effective oxidation resistive barrier

被引：58

作者：

Kalita, Golap ^{[1
,2
]}

Ayhan, Muhammed E. ^{[2
]}

Sharma, Subash ^{[2
]}

Shinde, Sachin M. ^{[2
]}

Ghimire, Dilip ^{[3
]}

Wakita, Koichi ^{[3
]}

Umeno, Masayoshi ^{[3
]}

Tanemura, Masaki ^{[2
]}

机构：

[1] Nagoya Inst Technol, Ctr Fostering Young & Innovat Reseachers, Nagoya, Aichi 4668555, Japan

[2] Nagoya Inst Technol, Dept Frontier Mat, Nagoya, Aichi 4668555, Japan

[3] Chubu Univ, Dept Elect & Informat Engn, Kasugai, Aichi 4878501, Japan

来源：

CORROSION SCIENCE | 2014年 / 78卷

关键词：

Oxidation; Copper; Passive films; Raman spectroscopy; CORROSION PROTECTION; COPPER FOILS; OXIDE; FILMS; TRANSPARENT; RESISTANCE; REDUCTION; MONOLAYER; ALLOYS; GROWTH;

D O I：

10.1016/j.corsci.2013.09.013

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An effective approach for preserving the metal surface from oxidation and corrosion is of a great importance for various practical and industrial applications. Here, we demonstrate that graphene coating by surface wave plasma (SWP) chemical vapor deposition (CVD) technique at low temperature (similar to 450 degrees C) is promising as an oxidation resistive barrier of Cu foil. A strong oxidation resistance performance is obtained for the Cu foil heated in atmospheric conditions with robust surface passivation by the deposited graphene film. The developed process can be exploited for various types of metals as graphene growth is independent of catalytic ability of the metal surface and scalable by a roll-to-roll deposition process. (C) 2013 Elsevier Ltd. All rights reserved.

引用

页码：183 / 187

页数：5

共 25 条

[1]

Bagri A, 2010, NAT CHEM, V2, P581, DOI [10.1038/nchem.686, 10.1038/NCHEM.686]

[2] Oxidation Resistance of Graphene-Coated Cu and Cu/Ni Alloy [J].