Magnetic properties of patterned Fe3O4 films

被引：5
|
作者：
Tsai, JL [1 ]
Huang, KT
Cheng, WC
Lee, MD
Chin, TS
Jen, SU
Lee, SF
Yao, YD
机构：
[1] Acad Sinica, Inst Phys, Taipei 115, Taiwan
[2] Natl Taiwan Univ Sci & Technol, Dept Mech Engn, Taipei, Taiwan
[3] Natl Tsing Hua Univ, Dept Mat Sci & Engn, Hsinchu, Taiwan
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2004年 / 272卷
关键词：
lithography; sputtering; verwey transition; antiphase domain;
D O I：
10.1016/j.jmmm.2003.12.1367
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Patterned Fe3O4 dots have been prepared on Si/SiO2 substrate by e-beam lithography and reactive magnetron sputtering. The magnetization show an abrupt change at the Verwey transition temperature around 120 K under the cooling field 500 Oe. The antiphase domain was observed in the 1 x 1 mum(2) Fe3O4 dot. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：1664 / 1665
页数：2
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