Characterization of Ag/Ti Schottky contact on ZnO thin film under UV exposure

ZnO thin film is fabricated by using thermal vacuum coating unit and exposed to the UV light where the target is the glass substrate. ZnO thin film is fabricated and Ti (100 nm)/Ag (100 nm) are deposited by the vacuum evaporation technique and shadow mask. The deposited contacts undergo annealing treatment to improve the crystal properties of the substrate. The substrate is exposed then to the UV light to analyse the thin film current and voltage performance characteristics of the deposited contacts by using a I-V parameter analyzer (Keysight B2902A). Several parameters like barrier height, saturation current, ideality factor and specific contact resistance are also estimated using a special method using the Schottky barrier height (SBH) method instead of another mechanism like transmission line method (TLM). (c)& nbsp;2020 Elsevier Ltd. All rights reserved. Selection and peer-review under responsibility of the scientific committee of the International Conference on Nanoelectronics, Nanophotonics, Nanomaterials, Nanobioscience & Nanotechnology.