Core-level photoemission study of the Bi-GaAs(111) A interface

被引:8
作者
McGinley, C
Cafolla, AA [1 ]
McLoughlin, E
Murphy, B
Teehan, D
Moriarty, P
Woolf, DA
机构
[1] Dublin City Univ, Dept Phys, Dublin 9, Ireland
[2] SERC, Daresbury Lab, Warrington WA4 4AD, Cheshire, England
[3] Univ Nottingham, Dept Phys, Nottingham NG7 2RD, England
[4] Univ Wales Coll Cardiff, Dept Phys & Astron, Cardiff CF2 3YB, S Glam, Wales
[5] NCSR, Dublin 9, Ireland
关键词
low-energy electron diffraction; synchrotron radiation photoelectron spectroscopy; surface relaxation and reconstruction; gallium arsenide (111)A; bismuth; metal-semiconductor interfaces;
D O I
10.1016/S0169-4332(00)00012-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Core-level photoemission spectra of the As 3d, Ga 3d and Bi 5d core levels were recorded for the Bi-GaAs (111)A-(2 X 2) surface. From the early stages of Bi growth, there are two distinct chemical environments for Bi. Surface Bi is bonded to both As and Ga atoms. The deposition of approximately 1 ML of Bi removes the dangling bonds from the surface As and Ga atoms, which are associated with the (2 X 2) vacancy-buckling structure. Annealing to 350 degrees C reverses this process and surface dangling bonds for Ga reappear. When the Bi had fully desorbed at 425 degrees C, photoemission and LEED results showed that the surface recovers the (2 X 2) vacancy structure but with a larger degree of surface disorder than that found before the deposition of Bi. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:292 / 300
页数:9
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