Plasma-catalytic removal of a low concentration of acetone in humid conditions

被引:47
作者
Zhu, Xinbo [1 ,2 ]
Gao, Xiang [1 ]
Zheng, Chenghang [1 ]
Wang, Zhihua [1 ]
Ni, Mingjiang [1 ]
Tu, Xin [2 ]
机构
[1] Zhejiang Univ, State Key Lab Clean Energy Utilizat, Hangzhou 310027, Zhejiang, Peoples R China
[2] Univ Liverpool, Dept Elect Engn & Elect, Liverpool L69 3GJ, Merseyside, England
基金
中国国家自然科学基金;
关键词
DIELECTRIC BARRIER DISCHARGE; VOLATILE ORGANIC-COMPOUNDS; NONTHERMAL PLASMA; CORONA DISCHARGE; PACKED-BED; HETEROGENEOUS CATALYSIS; CROSS-SECTIONS; INDOOR AIR; DECOMPOSITION; WATER;
D O I
10.1039/c4ra05985a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A coaxial dielectric barrier discharge (DBD) plasma reactor has been developed for plasma-catalytic removal of low concentration acetone over MOx/gamma-Al2O3 (M=Mn, Co, or Cu) catalysts. The effect of relative humidity of air (RH) on the discharge characteristics, acetone removal efficiency, CO2 selectivity, and byproduct formation with and without catalyst has been investigated. The results show that increasing the RH leads to a decrease of the specific energy density (SED) of the DBD, while packing gamma-Al2O3 supported metal oxide catalysts into the discharge gap enhances the SED of the discharge. The maximum acetone removal of 75.3% is achieved at an optimum RH of 10% using CoOx/gamma-Al2O3 beyond which the removal efficiency of acetone decreases with the increase of the RH. Higher RH inhibits the formation of energetic electrons while water can be adsorbed onto the catalyst surface and block active sites on the catalyst surface. It is found that increasing the air humidity enhances both CO2 selectivity and carbon balance, but decreases the formation of ozone. However, the formation of NOx slightly increases with increasing the gas humidity. In addition, the presence of these catalysts in the discharge significantly decreases the formation of unwanted byproducts (O-3 and NOx) and promotes the deep oxidation of acetone towards CO2 with an increased carbon balance.
引用
收藏
页码:37796 / 37805
页数:10
相关论文
共 69 条
[1]   Gas Purification by Nonthermal Plasma: A Case Study of Ethylene [J].
Aerts, R. ;
Tu, X. ;
Van Gaens, W. ;
Whitehead, J. C. ;
Bogaerts, A. .
ENVIRONMENTAL SCIENCE & TECHNOLOGY, 2013, 47 (12) :6478-6485
[2]   An Investigation into the Dominant Reactions for Ethylene Destruction in Non-Thermal Atmospheric Plasmas [J].
Aerts, Robby ;
Tu, Xin ;
De Bie, Christophe ;
Whitehead, J. Christopher ;
Bogaerts, Annemie .
PLASMA PROCESSES AND POLYMERS, 2012, 9 (10) :994-1000
[3]   Removal of gaseous toluene and submicron aerosol particles using a dielectric barrier discharge reactor [J].
Byeon, Jeong Hoon ;
Park, Jae Hong ;
Jo, Yoon Shin ;
Yoon, Ki Young ;
Hwang, Jungho .
JOURNAL OF HAZARDOUS MATERIALS, 2010, 175 (1-3) :417-422
[4]   Decomposition of toluene and acetone in packed dielectric barrier discharge reactors [J].
Chang, CL ;
Lin, TS .
PLASMA CHEMISTRY AND PLASMA PROCESSING, 2005, 25 (03) :227-243
[5]   Transient barrier discharge characteristics of parallel-plate-type, packed-bed, non-thermal plasma reactor under high-humidity conditions [J].
Chang, Jen-Shih ;
Uchida, Yoshihisa ;
Urashima, Kuniko ;
Taylor, Roy .
PLASMA PROCESSES AND POLYMERS, 2006, 3 (09) :721-726
[6]   Oxidation of ethylene by a multistage corona discharge system in the absence and presence of Pt/TiO2 [J].
Chavadej, Sumaeth ;
Saktrakool, Kanokwan ;
Rangsunvigit, Pramoch ;
Lobban, Lance L. ;
Sreethawong, Thammanoon .
CHEMICAL ENGINEERING JOURNAL, 2007, 132 (1-3) :345-353
[7]   Ozone production in the positive DC corona discharge: Model and comparison to experiments [J].
Chen, JH ;
Davidson, JH .
PLASMA CHEMISTRY AND PLASMA PROCESSING, 2002, 22 (04) :495-522
[8]   Detailed Characterization of 2-Heptanone Conversion by Dielectric Barrier Discharge in N2 and N2/O2 Mixtures [J].
Chiper, Alina Silvia ;
Blin-Simiand, Nicole ;
Heninger, Michel ;
Mestdagh, Helene ;
Boissel, Pierre ;
Jorand, Francois ;
Lemaire, Joel ;
Leprovost, Julien ;
Pasquiers, Stephane ;
Popa, Gheorghe ;
Postel, Christian .
JOURNAL OF PHYSICAL CHEMISTRY A, 2010, 114 (01) :397-407
[9]  
Chiper AS, 2006, J OPTOELECTRON ADV M, V8, P208
[10]   Adsorption of water on Cu2O and Al2O3 thin [J].
Deng, Xingyi ;
Herranz, Tirma ;
Weis, Christoph ;
Bluhm, Hendrik ;
Salmeron, Miquel .
JOURNAL OF PHYSICAL CHEMISTRY C, 2008, 112 (26) :9668-9672