Enhanced compositional sensitivity in atomic force microscopy by the excitation of the first two flexural modes

被引:141
作者
Martinez, N. F. [1 ]
Patil, S. [1 ]
Lozano, J. R. [1 ]
Garcia, R. [1 ]
机构
[1] CSIC, Inst Microelect, Madrid 28760, Spain
关键词
D O I
10.1063/1.2360894
中图分类号
O59 [应用物理学];
学科分类号
摘要
The authors demonstrate that the compositional sensitivity of an atomic force microscope is enhanced by the simultaneous excitation of its first two flexural eigenmodes. The coupling of those modes by the nonlinear probe-surface interactions enables to map compositional changes in several conjugated molecular materials with a phase shift sensitivity that is about one order of magnitude higher than the one achieved in amplitude modulation atomic force microscopy. (c) 2006 American Institute of Physics.
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页数:3
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