Fabrication of patterned media for high density magnetic storage

被引:228
作者
Ross, CA [1 ]
Smith, HI
Savas, T
Schattenburg, M
Farhoud, M
Hwang, M
Walsh, M
Abraham, MC
Ram, RJ
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[2] MIT, Dept Comp Sci & Elect Engn, Cambridge, MA 02139 USA
[3] MIT, Dept Phys, Cambridge, MA 02139 USA
[4] MIT, Ctr Space Res, Cambridge, MA 02139 USA
[5] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期
关键词
D O I
10.1116/1.590974
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Arrays of discrete, lithographically patterned magnetic elements have been proposed as a new generation of ultrahigh density patterned magnetic storage media. Interferometric lithography has been used to make prototype arrays over large areas with periods of 100-200 nm. Arrays of magnetic pillars, pyramids, and dots have been made by electrodeposition, evaporation and liftoff, and etching processes, and the magnetic properties of the particles and their mutual interactions have been measured. (C) 1999 American Vacuum Society. [S0734-211X(99)11906-1].
引用
收藏
页码:3168 / 3176
页数:9
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