Effects of buffer leakage current on breakdown characteristics in AlGaN/GaN HEMTs with a high-k passivation layer

被引:9
作者
Hanawa, Hideyuki [1 ]
Satoh, Yoshiki [1 ]
Horio, Kazushige [1 ]
机构
[1] Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan
关键词
GaN HEMT; Breakdown voltage; High-k passivation layer; Buffer leakage current; CURRENT TRANSIENTS; FIELD PLATE; ENHANCEMENT; PERFORMANCE; TRANSISTORS; SIMULATION; VOLTAGE;
D O I
10.1016/j.mee.2015.04.064
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A two-dimensional analysis of off-state breakdown characteristics in AlGaN/GaN HEMTs is performed by considering a deep donor and a deep acceptor in a buffer layer, with the relative permittivity of passivation layer epsilon(r) as a parameter. The analysis is made with and without impact ionization of carriers to study how the buffer leakage current affects the breakdown performance. It is shown that when 8, is low, the breakdown voltage is determined by the impact ionization of carriers, and when epsilon(r). becomes high, it is determined by the buffer leakage current. This buffer leakage current decreases as er increases because the electric field at the drain edge of the gate is weakened, and hence the breakdown voltage increases as er increases. It is also shown that when the gate voltage is more negative, the breakdown voltage in the high epsilon(r) region becomes higher because the buffer leakage current becomes smaller. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码:96 / 99
页数:4
相关论文
共 20 条
[1]   10-W/mm AlGaN-GaNHFET with a field modulating plate [J].
Ando, Y ;
Okamoto, Y ;
Miyamoto, H ;
Nakayama, T ;
Inoue, T ;
Kuzuhara, M .
IEEE ELECTRON DEVICE LETTERS, 2003, 24 (05) :289-291
[2]   AlGaN/GaN/AlGaN DH-HEMTs Breakdown Voltage Enhancement Using Multiple Grating Field Plates (MGFPs) [J].
Bahat-Treidel, Eldad ;
Hilt, Oliver ;
Brunner, Frank ;
Sidorov, Victor ;
Wuerfl, Joachim ;
Traenkle, Guenther .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2010, 57 (06) :1208-1216
[3]   Influence of Field Plate on the Transient Operation of the AlGaN/GaN HEMT [J].
Brannick, Alan ;
Zakhleniuk, Nick A. ;
Ridley, Brian K. ;
Shealy, James R. ;
Schaff, William J. ;
Eastman, Lester F. .
IEEE ELECTRON DEVICE LETTERS, 2009, 30 (05) :436-438
[4]   Electron initiated impact ionization in AlGaN alloys [J].
Bulutay, C .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2002, 17 (10) :L59-L62
[5]   Numerical Analysis of Breakdown Voltage Enhancement in AlGaN/GaN HEMTs With a High-k Passivation Layer [J].
Hanawa, Hideyuki ;
Onodera, Hiraku ;
Nakajima, Atsushi ;
Horio, Kazushige .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2014, 61 (03) :769-775
[6]   High-Performance Microwave Gate-Recessed AlGaN/AlN/GaN MOS-HEMT With 73% Power-Added Efficiency [J].
Hao, Yue ;
Yang, Ling ;
Ma, Xiaohua ;
Ma, Jigang ;
Cao, Menyi ;
Pan, Caiyuan ;
Wang, Chong ;
Zhang, Jincheng .
IEEE ELECTRON DEVICE LETTERS, 2011, 32 (05) :626-628
[7]   2-DIMENSIONAL ANALYSIS OF SUBSTRATE-RELATED KINK PHENOMENA IN GAAS-MESFETS [J].
HORIO, K ;
SATOH, K .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (12) :2256-2261
[8]   Physics-based simulation of buffer-trapping effects on slow current transients and current collapse in GaN field effect transistors [J].
Horio, K ;
Yonemoto, K ;
Takayanagi, H ;
Nakano, H .
JOURNAL OF APPLIED PHYSICS, 2005, 98 (12)
[9]   NUMERICAL-SIMULATION OF GAAS-MESFETS ON THE SEMI-INSULATING SUBSTRATE COMPENSATED BY DEEP TRAPS [J].
HORIO, K ;
YANAI, H ;
IKOMA, T .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (11) :1778-1785
[10]   Physical Mechanism of Buffer-Related Current Transients and Current Slump in AlGaN/GaN High Electron Mobility Transistors [J].
Horio, Kazushige ;
Nakajima, Atsushi .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (05) :3428-3433