共 20 条
Effects of buffer leakage current on breakdown characteristics in AlGaN/GaN HEMTs with a high-k passivation layer
被引:9
作者:

Hanawa, Hideyuki
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机构:
Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan

Satoh, Yoshiki
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机构:
Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan

Horio, Kazushige
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机构:
Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan
机构:
[1] Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan
关键词:
GaN HEMT;
Breakdown voltage;
High-k passivation layer;
Buffer leakage current;
CURRENT TRANSIENTS;
FIELD PLATE;
ENHANCEMENT;
PERFORMANCE;
TRANSISTORS;
SIMULATION;
VOLTAGE;
D O I:
10.1016/j.mee.2015.04.064
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
A two-dimensional analysis of off-state breakdown characteristics in AlGaN/GaN HEMTs is performed by considering a deep donor and a deep acceptor in a buffer layer, with the relative permittivity of passivation layer epsilon(r) as a parameter. The analysis is made with and without impact ionization of carriers to study how the buffer leakage current affects the breakdown performance. It is shown that when 8, is low, the breakdown voltage is determined by the impact ionization of carriers, and when epsilon(r). becomes high, it is determined by the buffer leakage current. This buffer leakage current decreases as er increases because the electric field at the drain edge of the gate is weakened, and hence the breakdown voltage increases as er increases. It is also shown that when the gate voltage is more negative, the breakdown voltage in the high epsilon(r) region becomes higher because the buffer leakage current becomes smaller. (C) 2015 Elsevier B.V. All rights reserved.
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页码:96 / 99
页数:4
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共 20 条
[1]
10-W/mm AlGaN-GaNHFET with a field modulating plate
[J].
Ando, Y
;
Okamoto, Y
;
Miyamoto, H
;
Nakayama, T
;
Inoue, T
;
Kuzuhara, M
.
IEEE ELECTRON DEVICE LETTERS,
2003, 24 (05)
:289-291

Ando, Y
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan

Okamoto, Y
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan

Miyamoto, H
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan

Nakayama, T
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan

Inoue, T
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan

Kuzuhara, M
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan
[2]
AlGaN/GaN/AlGaN DH-HEMTs Breakdown Voltage Enhancement Using Multiple Grating Field Plates (MGFPs)
[J].
Bahat-Treidel, Eldad
;
Hilt, Oliver
;
Brunner, Frank
;
Sidorov, Victor
;
Wuerfl, Joachim
;
Traenkle, Guenther
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
2010, 57 (06)
:1208-1216

Bahat-Treidel, Eldad
论文数: 0 引用数: 0
h-index: 0
机构:
Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany

Hilt, Oliver
论文数: 0 引用数: 0
h-index: 0
机构:
Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany

Brunner, Frank
论文数: 0 引用数: 0
h-index: 0
机构:
Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany

Sidorov, Victor
论文数: 0 引用数: 0
h-index: 0
机构:
Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany

Wuerfl, Joachim
论文数: 0 引用数: 0
h-index: 0
机构:
Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany

Traenkle, Guenther
论文数: 0 引用数: 0
h-index: 0
机构:
Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany Ferdinand Braun Inst Hochstfrequenztech FBH, D-12489 Berlin, Germany
[3]
Influence of Field Plate on the Transient Operation of the AlGaN/GaN HEMT
[J].
Brannick, Alan
;
Zakhleniuk, Nick A.
;
Ridley, Brian K.
;
Shealy, James R.
;
Schaff, William J.
;
Eastman, Lester F.
.
IEEE ELECTRON DEVICE LETTERS,
2009, 30 (05)
:436-438

Brannick, Alan
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Essex, Sch Elect Engn & Comp Sci, Colchester CO4 3SQ, Essex, England Univ Essex, Sch Elect Engn & Comp Sci, Colchester CO4 3SQ, Essex, England

Zakhleniuk, Nick A.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Essex, Sch Elect Engn & Comp Sci, Colchester CO4 3SQ, Essex, England Univ Essex, Sch Elect Engn & Comp Sci, Colchester CO4 3SQ, Essex, England

Ridley, Brian K.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Essex, Sch Elect Engn & Comp Sci, Colchester CO4 3SQ, Essex, England Univ Essex, Sch Elect Engn & Comp Sci, Colchester CO4 3SQ, Essex, England

Shealy, James R.
论文数: 0 引用数: 0
h-index: 0
机构:
Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14583 USA Univ Essex, Sch Elect Engn & Comp Sci, Colchester CO4 3SQ, Essex, England

Schaff, William J.
论文数: 0 引用数: 0
h-index: 0
机构:
Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14583 USA Univ Essex, Sch Elect Engn & Comp Sci, Colchester CO4 3SQ, Essex, England

Eastman, Lester F.
论文数: 0 引用数: 0
h-index: 0
机构:
Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14583 USA Univ Essex, Sch Elect Engn & Comp Sci, Colchester CO4 3SQ, Essex, England
[4]
Electron initiated impact ionization in AlGaN alloys
[J].
Bulutay, C
.
SEMICONDUCTOR SCIENCE AND TECHNOLOGY,
2002, 17 (10)
:L59-L62

论文数: 引用数:
h-index:
机构:
[5]
Numerical Analysis of Breakdown Voltage Enhancement in AlGaN/GaN HEMTs With a High-k Passivation Layer
[J].
Hanawa, Hideyuki
;
Onodera, Hiraku
;
Nakajima, Atsushi
;
Horio, Kazushige
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
2014, 61 (03)
:769-775

Hanawa, Hideyuki
论文数: 0 引用数: 0
h-index: 0
机构:
Shibaura Inst Technol, Fac Syst Engn, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Saitama 3378570, Japan

Onodera, Hiraku
论文数: 0 引用数: 0
h-index: 0
机构:
Shibaura Inst Technol, Fac Syst Engn, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Saitama 3378570, Japan

Nakajima, Atsushi
论文数: 0 引用数: 0
h-index: 0
机构:
Shibaura Inst Technol, Fac Syst Engn, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Saitama 3378570, Japan

Horio, Kazushige
论文数: 0 引用数: 0
h-index: 0
机构:
Shibaura Inst Technol, Fac Syst Engn, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Saitama 3378570, Japan
[6]
High-Performance Microwave Gate-Recessed AlGaN/AlN/GaN MOS-HEMT With 73% Power-Added Efficiency
[J].
Hao, Yue
;
Yang, Ling
;
Ma, Xiaohua
;
Ma, Jigang
;
Cao, Menyi
;
Pan, Caiyuan
;
Wang, Chong
;
Zhang, Jincheng
.
IEEE ELECTRON DEVICE LETTERS,
2011, 32 (05)
:626-628

Hao, Yue
论文数: 0 引用数: 0
h-index: 0
机构:
Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China

Yang, Ling
论文数: 0 引用数: 0
h-index: 0
机构:
Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China

Ma, Xiaohua
论文数: 0 引用数: 0
h-index: 0
机构:
Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China

Ma, Jigang
论文数: 0 引用数: 0
h-index: 0
机构:
Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China

Cao, Menyi
论文数: 0 引用数: 0
h-index: 0
机构:
Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China

Pan, Caiyuan
论文数: 0 引用数: 0
h-index: 0
机构:
Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China

Wang, Chong
论文数: 0 引用数: 0
h-index: 0
机构:
Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China

Zhang, Jincheng
论文数: 0 引用数: 0
h-index: 0
机构:
Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China Xidian Univ, Key Lab Wide Band Gap Semicond Mat & Devices, Sch Microelect, Xian 710071, Peoples R China
[7]
2-DIMENSIONAL ANALYSIS OF SUBSTRATE-RELATED KINK PHENOMENA IN GAAS-MESFETS
[J].
HORIO, K
;
SATOH, K
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1994, 41 (12)
:2256-2261

HORIO, K
论文数: 0 引用数: 0
h-index: 0
机构: FAC SYST ENGN,SHIBAURA INST TECHNOL,OMIYA,SAITAMA 330,JAPAN

SATOH, K
论文数: 0 引用数: 0
h-index: 0
机构: FAC SYST ENGN,SHIBAURA INST TECHNOL,OMIYA,SAITAMA 330,JAPAN
[8]
Physics-based simulation of buffer-trapping effects on slow current transients and current collapse in GaN field effect transistors
[J].
Horio, K
;
Yonemoto, K
;
Takayanagi, H
;
Nakano, H
.
JOURNAL OF APPLIED PHYSICS,
2005, 98 (12)

Horio, K
论文数: 0 引用数: 0
h-index: 0
机构: Faculty of Systems Engineering, Shibaura Institute of Technology, Minuma-ku, Saitama 337-8570

Yonemoto, K
论文数: 0 引用数: 0
h-index: 0
机构: Faculty of Systems Engineering, Shibaura Institute of Technology, Minuma-ku, Saitama 337-8570

Takayanagi, H
论文数: 0 引用数: 0
h-index: 0
机构: Faculty of Systems Engineering, Shibaura Institute of Technology, Minuma-ku, Saitama 337-8570

Nakano, H
论文数: 0 引用数: 0
h-index: 0
机构: Faculty of Systems Engineering, Shibaura Institute of Technology, Minuma-ku, Saitama 337-8570
[9]
NUMERICAL-SIMULATION OF GAAS-MESFETS ON THE SEMI-INSULATING SUBSTRATE COMPENSATED BY DEEP TRAPS
[J].
HORIO, K
;
YANAI, H
;
IKOMA, T
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1988, 35 (11)
:1778-1785

HORIO, K
论文数: 0 引用数: 0
h-index: 0
机构: UNIV TOKYO, INST IND SCI, FUNCT ORIENTED ELECTR RES CTR, MINATO KU, TOKYO 106, JAPAN

YANAI, H
论文数: 0 引用数: 0
h-index: 0
机构: UNIV TOKYO, INST IND SCI, FUNCT ORIENTED ELECTR RES CTR, MINATO KU, TOKYO 106, JAPAN

IKOMA, T
论文数: 0 引用数: 0
h-index: 0
机构: UNIV TOKYO, INST IND SCI, FUNCT ORIENTED ELECTR RES CTR, MINATO KU, TOKYO 106, JAPAN
[10]
Physical Mechanism of Buffer-Related Current Transients and Current Slump in AlGaN/GaN High Electron Mobility Transistors
[J].
Horio, Kazushige
;
Nakajima, Atsushi
.
JAPANESE JOURNAL OF APPLIED PHYSICS,
2008, 47 (05)
:3428-3433

Horio, Kazushige
论文数: 0 引用数: 0
h-index: 0
机构:
Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan

Nakajima, Atsushi
论文数: 0 引用数: 0
h-index: 0
机构:
Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan Shibaura Inst Technol, Fac Syst Engn, Minuma Ku, Saitama 3378570, Japan