Effects of ion beam etching of fused silica substrates on the laser-induced damage properties of antireflection coatings at 355 nm

被引：19

作者：

Guo, Kesheng ^{[1
,2
]}

Wang, Yanzhi ^{[1
]}

Chen, Ruiyi ^{[1
,2
]}

Zhu, Meiping ^{[1
]}

Yi, Kui ^{[1
]}

He, Hongbo ^{[1
]}

Shao, Jianda ^{[1
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Thin Film Opt, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China

[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China

来源：

OPTICAL MATERIALS | 2019年 / 90卷

基金：

中国国家自然科学基金;

关键词：

355; nm; Laser damage; AR coatings; Substrate cleaning; RESISTANCE; FABRICATION; OPTICS;

D O I：

10.1016/j.optmat.2019.02.034

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Antireflection (AR) coatings are deposited on UV grade fused silica substrates, which are cleaned in the dual ion beam sputtering device. Compared to ultrasonic and acid etching cleaning progress, ion beam etching improves the laser-induced damage threshold (LIDT) of substrates and AR coatings significantly at 355 nm. Ion beam etching declines the low LIDT defects drastically and removes lots of the impurity elements (Ce, Fe, K, and Na). Roughness test shows that the AR coatings and substrates with ion beam etching are very flat and of low roughness. Ion beam etching reduces the density of deep defect from substrates greatly. Damage morphologies show double layers delamination, which is explained via calculation of layer stress. This study will be helpful for preparation of high LIDT optical coatings.

引用

页码：172 / 179

页数：8

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