High-performance InGaP/GaAs pnp δ-doped heterojunction bipolar transistor

被引:12
|
作者
Tsai, Jung-Hui [1 ]
Chiu, Shao-Yen [2 ]
Lour, Wen-Shiung [2 ]
Guo, Der-Feng [3 ]
机构
[1] Natl Kaohsiung Normal Univ, Dept Elect Engn, Kaohsiung 802, Taiwan
[2] Natl Taiwan Ocean Univ, Dept Elect Engn, Chilung, Taiwan
[3] AF Acad, Dept Elect Engn, Kaohsiung, Taiwan
关键词
OFFSET VOLTAGE;
D O I
10.1134/S1063782609070227
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this article, a novel InGaP/GaAs pnp delta-doped heterojunction bipolar transistor is first demonstrated. Though the valence band discontinuity at InGaP/GaAs heterojunction is relatively large, the addition of a delta-doped sheet between two spacer layers at the emitter-base (E-B) junction effectively eliminates the potential spike and increases the confined barrier for electrons, simultaneously. Experimentally, a high current gain of 25 and a relatively low E-B offset voltage of 60 mV are achieved. The offset voltage is much smaller than the conventional InGaP/GaAs pnp HBT. The proposed device could be used for linear amplifiers and low-power complementary integrated circuit applications.
引用
收藏
页码:939 / 942
页数:4
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