Gravimetric, electrochemical, and morphological studies of an isoxazole derivative as corrosion inhibitor for mild steel in 1M HCl

被引:40
|
作者
Aslam, Jeenat [1 ]
Aslam, Ruby [2 ]
Alrefaee, Salhah Hamed [1 ]
Mobin, Mohammad [2 ]
Aslam, Afroz [3 ]
Parveen, Mehtab [3 ]
Hussain, Chaudhery Mustansar [4 ]
机构
[1] Taibah Univ, Coll Sci, Dept Chem, Al Madina 30799, Saudi Arabia
[2] Aligarh Muslim Univ, Fac Engn & Technol, Dept Appl Chem, Corros Res Lab, Aligarh 202002, Uttar Pradesh, India
[3] Aligarh Muslim Univ, Fac Sci, Dept Chem, Aligarh 202002, Uttar Pradesh, India
[4] New Jersey Inst Technol, Dept Chem & Environm Sci, Newark, NJ 07102 USA
关键词
Metal corrosion; Acid inhibition; Eco-friendly compound; Mix-type inhibitor; Electrochemical study; LOW-CARBON STEEL; ACIDIC MEDIUM; HETEROCYCLIC-COMPOUNDS; SULFURIC-ACID; ADSORPTION; SURFACTANTS; PERFORMANCE;
D O I
10.1016/j.arabjc.2020.09.008
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
In present study, an isoxazole derivative, namely, (Z)-4-(4-hydroxy-3-methoxybenzyli dene)-3-methylisoxazol-5(4H)-one referred here as (IOD) has been studied as an environment-friendly corrosion inhibitor for mild steel (MS) in acidic medium (1 M HCl). The present work was investigated by gravimetric, electrochemical impedance spectroscopy (EIS), potentiodynamic polarization (PDP), fourier-transform infrared (FT-IR) spectroscopy techniques. Atomic force microscopy (AFM), scanning electron microscopy (SEM), and energy-dispersive X-ray spectroscopy (EDS) confirmed the surface morphologies of the MS surface with and without IOD in the acid medium. The inhibition efficiency (I.E.) of IOD was increased by rising its concentration attaining maximum value (96.6%) at 300 ppm at 30 degrees C and decreases with increasing temperature from 30 degrees C to 60 degrees C. The adsorption of studied inhibitor followed Langmuir adsorption isotherm model. The PDP study revealed that the IOD acts as a mixed-type inhibitor with predominating anodic effect. The EIS study confirmed that increasing IOD concentration enhances the charge transfer resistance (R-ct) and then reduces the double layer capacitance (C-dl) owing to the development of a protective layer on the MS surface. (C) 2020 The Author(s). Published by Elsevier B.V.
引用
收藏
页码:7744 / 7758
页数:15
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