Rapid prototyping of silica glass microstructures by the LIBWE method: Fabrication of deep microtrenches

被引：21

作者：

Kawaguchi, Yoshizo ^{[1
]}

Sato, Tadatake ^{[1
]}

Narazaki, Aiko ^{[1
]}

Kurosaki, Ryozo ^{[1
]}

Niino, Hiroyuki ^{[1
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, Photon Res Inst, Tsuchiura, Ibaraki 3058565, Japan

来源：

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY | 2006年 / 182卷 / 03期

关键词：

silica glass; surface-microstructuring; nanosecond-pulsed UV laser; microtrench; rapid prototyping;

D O I：

10.1016/j.jphotochem.2006.05.033

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have constructed a system for surface-microstructuring transparent materials, such as silica glass, using laser-induced backside wet etching (LIBWE), which includes an excimer laser and a mask projection system. In this report, we describe the advantages of the LIBWE method and present various results showing deep microtrenches fabricated using this method. We examine the applicability of this method to rapid prototyping, and propose a mechanism for the formation of deep microtrenches. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：319 / 324

页数：6

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