Investigation of transient surface electric field induced by femtosecond laser irradiation of aluminum

被引：11
|
作者：
Li, Run-Ze [1 ,2 ]
Zhu, Pengfei [1 ,2 ]
Chen, Long [1 ,2 ]
Xu, Tong [1 ,2 ]
Chen, Jie [1 ,2 ]
Cao, Jianming [1 ,2 ,3 ,4 ]
Sheng, Zheng-Ming [1 ,2 ,5 ]
Zhang, Jie [1 ,2 ]
机构：
[1] Shanghai Jiao Tong Univ, Minist Educ, Key Lab Laser Plasmas, Shanghai 200240, Peoples R China
[2] Shanghai Jiao Tong Univ, Dept Phys & Astron, Shanghai 200240, Peoples R China
[3] Florida State Univ, Dept Phys, Tallahassee, FL 32310 USA
[4] Florida State Univ, Natl High Magnet Field Lab, Tallahassee, FL 32310 USA
[5] Univ Strathclyde, Dept Phys, SUPA, Glasgow G4 0NG, Lanark, Scotland
来源：
NEW JOURNAL OF PHYSICS | 2014年 / 16卷
基金：
中国国家自然科学基金; 美国国家科学基金会;
关键词：
transient electric field; ultrafast electron diffraction; photoemission spectroscopy; PHOTOEMISSION-SPECTROSCOPY; PHOTOELECTRIC-EMISSION; METALS; CRYSTALLOGRAPHY; DIFFRACTION; ABLATION; SOLIDS; MIRROR; PULSES; DAMAGE;
D O I：
10.1088/1367-2630/16/10/103013
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Transient surface electric fields induced by femtosecond laser irradiation of an aluminum film were investigated directly by ultrashort electron pulses. At pump intensities of 2.9 similar to 7.1 x 10(10) W cm(-2), the transient electric fields last at least one nanosecond with a maximum field strength of 3.2 similar to 5.3 x 10(4) V m(-1) at 120 mu m above the aluminum surface. The transient electric fields and the associated evolution of photoelectrons were explained by a 'three-layer' model. The potential influence of such fields on reflection ultrafast electron diffraction and time-resolved angle-resolved photoemission spectroscopy were evaluated.
引用
收藏
页数：13
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