Periodic nanostructures fabricated by Talbot extreme ultraviolet lithography

被引：1
作者：
Li, W. [1 ]
Patel, D. [1 ]
Menoni, C. S. [1 ]
Stein, A. [2 ]
Chao, W. [3 ]
Anderson, E. [3 ]
Marcon, M. C. [1 ]
机构：
[1] Colorado State Univ, NSF Engn Res Ctr Extreme Ultraviolet Sci & Techno, Ft Collins, CO 80523 USA
[2] Center Funct Nano Mat Brookhaven Natl Lab, Upton, NY USA
[3] Center X Ray Optic Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
来源：
MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY XIX | 2014年 / 8973卷
关键词：
Extreme ultraviolet; laser; nanostructures; Talbot; table top; PHOTONIC CRYSTALS;
D O I：
10.1117/12.2041688
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A table top nanofabrication system which combines the classic Talbot imaging effect and a compact table top soft-x ray laser is described in this paper. Periodic nanostructures on millimeter square are fabricated using this robust, simple and defect tolerant fabrication method. Talbot lithography allows for a complete coherent extreme ultraviolet lithography process in a compact table top system. Double exposure allowed for the reduction of the feature sizes.
引用
收藏
页数：5
相关论文
共 50 条
[41]   EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography [J].
Grantham, S ;
Hill, SB ;
Tarrio, C ;
Vest, RE ;
Lucatorto, TB .
Emerging Lithographic Technologies IX, Pts 1 and 2, 2005, 5751 :1185-1191
[42]   Qualitative and Quantitative Measurement of Outgassing of Molecular Glass Photoresists under Extreme Ultraviolet Lithography [J].
Chen, Jin-Ping ;
Hao, Qing-Shan ;
Wang, Shuang-Qing ;
Yang, Shu-Min ;
Zhao, Jun ;
Wu, Yan-Qing ;
Zeng, Yi ;
Yu, Tian-Jun ;
Yang, Guo-Qiang ;
Li, Yi .
CHINESE JOURNAL OF ANALYTICAL CHEMISTRY, 2020, 48 (12) :1658-1665
[43]   Hollow laser self-confined plasma for extreme ultraviolet lithography and other applications [J].
Sizyuk, V. ;
Hassanein, A. ;
Sizyuk, T. .
LASER AND PARTICLE BEAMS, 2007, 25 (01) :143-154
[44]   Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces [J].
Mao S. ;
Li Y. ;
Liu K. ;
Liu L. ;
Zheng M. ;
Yan X. .
Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering, 2019, 48 (08)
[45]   Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography [J].
Dieleman, Christian D. ;
Ding, Weiyi ;
Wu, Lianjia ;
Thakur, Neha ;
Bespalov, Ivan ;
Daiber, Benjamin ;
Ekinci, Yasin ;
Castellanos, Sonia ;
Ehrler, Bruno .
NANOSCALE, 2020, 12 (20) :11306-11316
[46]   Table-top microscope for at-wavelength inspection of Extreme Ultraviolet Lithography Mask [J].
Brizuela, Fernando ;
Wang, Yong ;
Brewer, Courtney A. ;
Pedaci, Francesco ;
Chao, Weilun ;
Anderson, Erik H. ;
Liu, Yanwei ;
Goldberg, Kenneth A. ;
Naulleau, Patrick ;
Wachulak, Przemyslaw ;
Marconi, Mario C. ;
Attwood, David T. ;
Rocca, Jorge J. ;
Menoni, Carmen S. .
2009 IEEE LEOS ANNUAL MEETING CONFERENCE PROCEEDINGS, VOLS 1AND 2, 2009, :51-+
[47]   Surface modification of extreme-ultraviolet lithography mask blanks by e-beam [J].
Kadaksham, Arun John ;
Laursen, Thomas ;
Owen, Timothy ;
Underwood, Jon ;
Rastegar, Abbas .
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2011, 10 (04)
[48]   Laser-produced plasma light source for extreme-ultraviolet lithography applications [J].
Abhari, Reza S. ;
Rollinger, Bob ;
Giovannini, Andrea Z. ;
Morris, Oran ;
Henderson, Ian ;
Ellwi, Samir S. .
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02)
[49]   Laser interference lithography using spray/spin photoresist development method for consistent periodic nanostructures [J].
Kim, Hyungmo ;
Kim, Dasook ;
Lee, Chan ;
Kim, Joonwon .
CURRENT APPLIED PHYSICS, 2014, 14 (02) :209-214
[50]   Characterizing the Grating-like Nanostructures Formed on BaF2 Surfaces Exposed to Extreme Ultraviolet Laser Radiation [J].
Cui, Huaiyu ;
Frolov, Alexandr ;
Schmidt, Jiri ;
Straus, Jaroslav ;
Burian, Tomas ;
Hajkova, Vera ;
Chalupsky, Jaromir ;
Zhao, Yongpeng ;
Kolacek, Karel ;
Juha, Libor .
APPLIED SCIENCES-BASEL, 2022, 12 (03)
12345