Periodic nanostructures fabricated by Talbot extreme ultraviolet lithography

被引：1
作者：
Li, W. [1 ]
Patel, D. [1 ]
Menoni, C. S. [1 ]
Stein, A. [2 ]
Chao, W. [3 ]
Anderson, E. [3 ]
Marcon, M. C. [1 ]
机构：
[1] Colorado State Univ, NSF Engn Res Ctr Extreme Ultraviolet Sci & Techno, Ft Collins, CO 80523 USA
[2] Center Funct Nano Mat Brookhaven Natl Lab, Upton, NY USA
[3] Center X Ray Optic Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
来源：
MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY XIX | 2014年 / 8973卷
关键词：
Extreme ultraviolet; laser; nanostructures; Talbot; table top; PHOTONIC CRYSTALS;
D O I：
10.1117/12.2041688
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A table top nanofabrication system which combines the classic Talbot imaging effect and a compact table top soft-x ray laser is described in this paper. Periodic nanostructures on millimeter square are fabricated using this robust, simple and defect tolerant fabrication method. Talbot lithography allows for a complete coherent extreme ultraviolet lithography process in a compact table top system. Double exposure allowed for the reduction of the feature sizes.
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页数：5
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